Structural control of vertically aligned multiwalled carbon nanotubes by radio-frequency plasmas

Authors

Jitendra Menda, Michigan Technological University
Benjamin Ulmen, Michigan Technological University
Lakshman Kumar Vanga, Michigan Technological University
Vijaya Kayastha, Michigan Technological University
Yoke Khin Yap, Michigan Technological UniversityFollow
Zhengwei Pan, Oak Ridge National Laboratory
Ilia Ivanov, Oak Ridge National Laboratory
Alex Puretzky, Oak Ridge National Laboratory
David Geohegan, Oak Ridge National Laboratory

Document Type

Article

Publication Date

10-18-2005

Abstract

Plasma-enhanced chemical vapor deposition is the only technique for growing individual vertically aligned multiwalled carbon nanotubes (VA-MWCNTs) at desired locations. Inferior graphitic order has been a long-standing issue that has prevented realistic applications of these VA-MWCNTs. Previously, these VA-MWCNTs were grown by a one-plasma approach. Here, we demonstrate the capability of controlling graphitic order and diameters of VA-MWCNTs by decoupling the functions of the conventional single plasma into a dual-plasma configuration. Our results indicate that the ionic flux and kinetic energy of the growth species are important for improving graphitic order of VA-MWCMTs.

Publisher's Statement

© 2005 American Institute of Physics. Publisher’s version of record: https://doi.org/10.1063/1.2115068

Publication Title

Applied Physics Letters

Recommended Citation

Menda, J., Ulmen, B., Vanga, L. K., Kayastha, V., Yap, Y. K., Pan, Z., Ivanov, I., Puretzky, A., & Geohegan, D. (2005). Structural control of vertically aligned multiwalled carbon nanotubes by radio-frequency plasmas. Applied Physics Letters, 87(17), 173106-1-173106-3. http://doi.org/10.1063/1.2115068
Retrieved from: https://digitalcommons.mtu.edu/physics-fp/305

Version

Publisher's PDF