Atomic oxygen densities in a downstream microwave O < inf> 2 /Ar plasma source
Document Type
Article
Publication Date
12-1-2007
Abstract
An intense source of atomic oxygen is reported in this paper. Oxygen atoms were produced in an Ar/O2, 2.45 GHz, microwave discharge at flow rates ranging from 10 to 150 sccm and pressures from 0.5 to 4 Torr. The absolute flow rate of atomic oxygen peaked at 70 sccm which corresponded to a fractional dissociation close to 0.5. The atomic oxygen flow rate was measured using a titration method with NO2 gas. It was also shown that the emission ratio from the 3p3P state of an oxygen atom at 844.6 nm and from the 3p54p state of an argon atom at 750.4 nm was strongly correlated with oxygen atom to argon concentrations at some experimental conditions, e.g. modest Ar/O2 flow ratios. © 2007 IOP Publishing Ltd.
Publication Title
Plasma Sources Science and Technology
Recommended Citation
Ershov, A.,
&
Borysow, J.
(2007).
Atomic oxygen densities in a downstream microwave O < inf> 2 /Ar plasma source.
Plasma Sources Science and Technology,
16(4), 798-802.
http://doi.org/10.1088/0963-0252/16/4/015
Retrieved from: https://digitalcommons.mtu.edu/michigantech-p/9657