Atomic resolution study of local strains in doped VO < inf> 2 nanowires

Authors

Hasti Asayesh-Ardakani, Michigan Technological University
Anmin Nie, Michigan Technological University
Peter M. Marley, University at Buffalo, The State University of New York
Sujay Singh, University at Buffalo, The State University of New York
Patrick J. Philips, University of Illinois at Chicago
Farzad Mashayek, University of Illinois at Chicago
Ganapathy Sambandamurthy, University at Buffalo, The State University of New York
Ke Bin Low, University of Illinois at Chicago
Robert F. Klie, University of Illinois at Chicago
Sarbajit Banerjee, University at Buffalo, The State University of New York
Gregory M. Odegard, Michigan Technological UniversityFollow
Reza Shahbazian-Yassar, Michigan Technological University

Document Type

Conference Proceeding

Publication Date

8-1-2014

Publication Title

Microscopy and Microanalysis

Recommended Citation

Asayesh-Ardakani, H., Nie, A., Marley, P., Singh, S., Philips, P., Mashayek, F., Sambandamurthy, G., Low, K., Klie, R., Banerjee, S., Odegard, G., & Shahbazian-Yassar, R. (2014). Atomic resolution study of local strains in doped VO < inf> 2 nanowires. Microscopy and Microanalysis, 20(3), 1074-1075. http://doi.org/10.1017/S1431927614007090
Retrieved from: https://digitalcommons.mtu.edu/michigantech-p/7771