Growth of diamond thin films by chemical vapour deposition
Document Type
Article
Publication Date
12-1994
Department
Department of Electrical and Computer Engineering
Abstract
Deposition of diamond thin films on non-diamond substrates at low pressures ( < 760 torr) and low temperatures ( < 2000°C) by chemical vapour deposition (CVD) has been the subject of intense research in the last few years. The structural and the electrical properties of CVD diamond films grown on p-type 〈111〉 and high-resistivity (> 100 kΩ-cm) 〈100〉 oriented silicon substrates by hot filament chemical vapour deposition technique are described in this review paper.
Publication Title
Bulletin of Materials Science
Recommended Citation
Kulkarni, A.
(1994).
Growth of diamond thin films by chemical vapour deposition.
Bulletin of Materials Science,
17(7), 1379-1391.
http://doi.org/10.1007/BF02747235
Retrieved from: https://digitalcommons.mtu.edu/michigantech-p/4516
