A dual-RF-plasma approach for controlling the graphitic order and diameters of vertically-aligned multiwall carbon nanotubes
Document Type
Article
Publication Date
2004
Department
Department of Physics
Abstract
Plasma enhanced chemical vapor deposition (PECVD) is a unique technique for growing vertically-aligned multiwall carbon nanotubes (VA-MWNTs) at controllable tube densities. This technique is of considerable importance for low temperature growth of VA-MWNTs at desired locations. However, the graphitic order of these MWNTs is inferior to those grown by laser ablation, arc discharge, and thermal CVD techniques. Previously, these VA-MWNTs were grown by a one-plasma approach (DC, microwave etc), either for gas decomposition or substrate biasing. Here, we describe a dual-RF plasma enhanced CVD (dual-RF-PECVD) technique that offers unique capability for controlling the graphitic order and diameters of VA-MWNTs.
Publication Title
MRS Proceedings Online
Recommended Citation
Menda, J.,
Vanga, L. K.,
Ulmen, B.,
Yap, Y. K.,
Pan, Z.,
Ivanov, I.,
Puretzky, A.,
&
Geohegan, D.
(2004).
A dual-RF-plasma approach for controlling the graphitic order and diameters of vertically-aligned multiwall carbon nanotubes.
MRS Proceedings Online,
858.
http://doi.org/10.1557/PROC-858-HH3.11
Retrieved from: https://digitalcommons.mtu.edu/michigantech-p/124
Publisher's Statement
© Materials Research Society 2005. Publisher's version of record: https://doi.org/10.1557/PROC-858-HH3.11