Metrology and quantification of micromilled X-ray masks and exposures
Document Type
Conference Proceeding
Publication Date
7-7-1997
Abstract
© 1994 SPIE. Micromechanical milling has been shown to be a rapid and direct method for the production of X-ray masks with features within the process limits. A method for compensating milling tool run out has been adapted and the tolerance of mask absorber features has been reduced to approximately 0.5 micrometers. The milling process leaves some absorber burrs and the absorber is also tapered at the machined wall which introduces an additional process bias, both of which add to exposure degradation. Nevertheless, both of these effects can be greatly reduced with further work.
Publication Title
Proceedings of SPIE - The International Society for Optical Engineering
Recommended Citation
Friedrich, C.,
Coane, P.,
Goettert, J.,
&
Gopinathin, N.
(1997).
Metrology and quantification of micromilled X-ray masks and exposures.
Proceedings of SPIE - The International Society for Optical Engineering,
3048, 193-197.
http://doi.org/10.1117/12.275776
Retrieved from: https://digitalcommons.mtu.edu/michigantech-p/12085