Three-dimensional patterning in polymer optical waveguides using focused ion beam milling
Document Type
Article
Publication Date
7-1-2016
Abstract
© 2016 The Authors. Waveguide (WG) photonic-bridge taper modules are designed for symmetric planar coupling between silicon WGs and single-mode fibers (SMFs) to minimize photonic chip and packaging footprint requirements with improving broadband functionality. Micromachined fabrication and evaluation of polymer WG tapers utilizing high-resolution focused ion beam (FIB) milling is performed and presented. Polymer etch rates utilizing the FIB and optimal methods for milling polymer tapers are identified for three-dimensional patterning. Polymer WG tapers with low sidewall roughness are manufactured utilizing FIB milling and optically tested for fabrication loss. FIB platforms utilize a focused beam of ions (Ga+) to etch submicron patterns into substrates. Fabricating low-loss polymer WG taper prototypes with the FIB before moving on to mass-production techniques provides theoretical understanding of the polymer taper and its feasibility for connectorization devices between silicon WGs and SMFs.
Publication Title
Journal of Micro/ Nanolithography, MEMS, and MOEMS
Recommended Citation
Kruse, K.,
Burrell, D.,
&
Middlebrook, C.
(2016).
Three-dimensional patterning in polymer optical waveguides using focused ion beam milling.
Journal of Micro/ Nanolithography, MEMS, and MOEMS,
15(3).
http://doi.org/10.1117/1.JMM.15.3.034505
Retrieved from: https://digitalcommons.mtu.edu/michigantech-p/12013
