Effects of lithographic roughness and sidewall slope on the optical performance of polymer rectangular waveguides: Modeling
Document Type
Conference Proceeding
Publication Date
12-27-2010
Abstract
Fabrication of polymer, multimode, channel waveguides have gained much attention recently because of usefulness in replacing fiber in backplane interconnects. Waveguides are more desirable because they are able to achieve greater bandwidth, they are immune to electromagnetic interference and they consume less power compared to traditional electrical communication links. They are however subject to insertion losses due to fabrication defects such as the waveguide sidewall roughness and sidewall slope. This requires fabrication tolerances that are on the micron level. Determining the acceptable minimum tolerances required in the fabrication process in terms of the overall channel link budget is critical for determining how precise of fabrication methods must be utilized. © 2010 IEEE.
Publication Title
2010 IEEE Avionics, Fiber-Optics and Photonics Technology Conference, AVFOP 2010
Recommended Citation
Riegel, N.,
Middlebrook, C.,
Buller, W.,
&
Roggemann, M.
(2010).
Effects of lithographic roughness and sidewall slope on the optical performance of polymer rectangular waveguides: Modeling.
2010 IEEE Avionics, Fiber-Optics and Photonics Technology Conference, AVFOP 2010, 35-36.
http://doi.org/10.1109/AVFOP.2010.5637743
Retrieved from: https://digitalcommons.mtu.edu/michigantech-p/10340