Growth of diamond thin films by chemical vapour deposition
Deposition of diamond thin films on non-diamond substrates at low pressures ( < 760 torr) and low temperatures ( < 2000°C) by chemical vapour deposition (CVD) has been the subject of intense research in the last few years. The structural and the electrical properties of CVD diamond films grown on p-type 〈111〉 and high-resistivity (> 100 kΩ-cm) 〈100〉 oriented silicon substrates by hot filament chemical vapour deposition technique are described in this review paper. © 1994 the Indian Academy of Sciences.
Bulletin of Materials Science
Growth of diamond thin films by chemical vapour deposition.
Bulletin of Materials Science,
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