Computational study of texture development during templated grain growth

Document Type

Conference Proceeding

Publication Date



Department of Materials Science and Engineering


Development of crystallographic texture in polycrystals during templated grain growth process is studied by phase field modeling and computer simulation. To characterize the grain texture development, X-ray diffraction peak intensities are computed for the evolving grain structures as simulated by the phase field model, based on which Lotgering factor is further calculated as a quantitative measurement of uniaxial texturing. While the phase field modeling allows direct comparison between simulated grain structures and experimental microscopy observations, the computational diffraction allows convenient correlation between computer simulation and experimental X-ray diffraction characterization. The latter feature is especially desirable, since microscopy experiments normally require more efforts than X-ray diffraction, and diffraction is usually the preferred choice for material characterization.

Publication Title

TMS Annual Meeting