Phase-field microelastic modeling of microstructure evolutions in free-standing thin films

Document Type

Article

Publication Date

11-1-2012

Department

Department of Materials Science and Engineering

Abstract

Phase-field microelastic modeling of microstructure evolutions in free-standing thin films is developed. Khachaturyan's microelasticity theory is reformulated to account for the plane-stress condition of free-standing thin films. As examples, the model is applied to simulate two-phase (disordered face-centered cubic + ordered L1 2) microstructures formed by decomposition and ordering in free-standing thin films of different orientations. Significant effects of the film orientation on the precipitate microstructure morphology are observed, which are analyzed in terms of the anisotropy of the orientation-dependent effective elastic modulus tensor of the free-standing thin films. Distinctive microstructure features in free-standing thin films are discussed in comparison with that observed in bulk materials.

Publisher's Statement

© 2012 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved. Publisher’s version of record: https://doi.org/10.1016/j.actamat.2012.08.019

Publication Title

Acta Materialia

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