Title

Diffusion of water molecules in amorphous silica

Authors

Sarah Kostinski, Harvard University
Ravindra Pandey, Michigan Technological UniversityFollow
Gowtham S, Michigan Technological UniversityFollow
Udo Pernisz, Dow Corning Corporation
Alexander Kostinski, Michigan Technological UniversityFollow

Document Type

Article

Publication Date

6-2012

Abstract

The diffusive penetration of atmospheric water vapor into amorphous silica (a-SiO₂) degrades the performance of electronic devices. In this letter, we calculate the range of activation energies for water diffusion in a-SiO₂ such that the diffusion time through, for example, a 0.5-m protective layer is on the order of the decadal time scale, as required in typical applications. We find that for all practical purposes, silica composed of n -member rings is impenetrable to water vapor for n ≤ 5 . Thus, we conclude that the distribution of n-member rings in a-SiO₂ and, specifically, the n >; 5 fraction is the critical parameter for predicting device performance.

Publisher's Statement

© 2012 Institute of Electrical and Electronics Engineers. Publisher's version of record: http://dx.doi.org/10.1109/LED.2012.2189750

Publication Title

IEEE Electron Device Letters

Recommended Citation

Kostinski, S., Pandey, R., S, G., Pernisz, U., & Kostinski, A. (2012). Diffusion of water molecules in amorphous silica. IEEE Electron Device Letters, 33(6), 863-865. http://doi.org/10.1109/LED.2012.2189750
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